Hydrogen fluoride is used at around a quarter of U.S. refineries in the alkylation process, but accidental releases and near-misses have prompted calls to switch to other methods. EPA on Monday denied ...
Researchers from Lam Research, the University of Colorado Boulder, and Princeton Plasma Physics Laboratory (PPPL) investigated ways to speed up the cryogenic reactive ion etching process for 3D NAND ...
Freezing edge technology: A new plasma-based etching process could lead to denser data storage in phones, cameras, and computers. Researchers have developed a hydrogen fluoride plasma technique that ...
An accident involving the potentially lethal compound used in making high-octane gasoline could threaten hundreds of thousands of nearby residents. Environmental groups want a federal judge to order ...
Tech Xplore on MSN
New semiconductor etching process achieves five-fold speed improvement
After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor etching method that achieves etch rates up to five times faster than ...
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